A method for cleaning and conditioning a plasma processing chamber wherein oxide residues have been previously formed on interior surfaces o
US5647953A US08/577,340 US57734095A US5647953A US 5647953 A US5647953 A US 5647953A US 57734095 A US57734095 A US 57734095A US 5647953 A US5647953 A US 5647953A Authority US United States Prior art keywords gas chamber plasma interior cleaning Prior art date 1995-12-22 Legal status (The legal status is an assumption and is not a legal conclusion.
5647953. Registration Date. 2019-01-08. Mark Drawing. 4000 - Standard character mark Typeset. Published for Opposition Date. 2018-10-23. Attorney Name. Jonathan G ...
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Download PDF 5647953 . US Patent References: 5503676: Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber: 1996-04-02: ...
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